SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Advanced ARCH resist
Bantu, N. R., Marshall, J., Holt, T., Perry, D., Khan, D.Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312368
File:
PDF, 1.93 MB
english, 1998