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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Optimization of etch conditions for a silicon-containing methacrylate-based bilayer resist for 193-nm lithography
Steinhaeusler, Thomas, Gabor, Allen H., White, Daniela, Blakeney, Andrew J., Stark, David R., Miller, Daniel A., Rich, Georgia K., Graffenberg, Victoria L., Dean, Kim R.Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312373
File:
PDF, 1.11 MB
english, 1998