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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Progress in 193-nm top-surface imaging process development
Hutchinson, John M., Rao, Veena, Zhang, Guojing, Pawloski, Adam R., Fonseca, Carlos A., Chambers, Janet, Holl, Susan M., Das, Siddhartha, Henderson, Craig C., Wheeler, David R.Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312405
File:
PDF, 3.17 MB
english, 1998