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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Etch integration issues in the development of deep submicron contacts utilizing DUV resist and organic BARC
Ramanathan, Viswanathan, Chen, Shixiong, Lai, Kafai, Brongo, Maureen R., Samarakone, NandasiriVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312473
File:
PDF, 3.38 MB
english, 1998