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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Revisit pattern collapse for 14nm node and beyond
Yoshimoto, Kenji, Allen, Robert D., Somervell, Mark H., Higgins, Craig, Raghunathan, Ananthan, Hartley, John G., Goldfarb, Dario L., Kato, Hirokazu, Petrillo, Karen, Colburn, Matthew E., Schefske, JefVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.880180
File:
PDF, 1.40 MB
english, 2011