SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Enhancement of correction for mask process through dose correction on already geometrically corrected layout data
Reddy, Murali M., Abboud, Frank E., Faure, Thomas B., D. S. S., Bhardwaj, Guntupalli, Nageswara Rao, Rajagopalan, Archana, Pai, Ravi R.Volume:
8522
Year:
2012
Language:
english
DOI:
10.1117/12.964408
File:
PDF, 285 KB
english, 2012