[IEEE 2014 Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2014.6.8-2014.6.9)] 2014 Silicon Nanoelectronics Workshop (SNW) - Improvement in reliability characteristics (retention and endurance) of RRAM by using high-pressure hydrogen annealing
Song, Jeonghwan, Lee, Daeseok, Woo, Jiyong, Cha, Euijun, Lee, Sangheon, Park, Jaesung, Moon, Kibong, Koo, Yunmo, Prakash, Amit, Hwang, HyunsangYear:
2014
Language:
english
DOI:
10.1109/snw.2014.7348588
File:
PDF, 485 KB
english, 2014