SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Application of artificial neural networks to compact mask models in optical lithography simulation
Agudelo, Viviana, Conley, Will, Fühner, Tim, Erdmann, Andreas, Evanschitzky, PeterVolume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2011132
File:
PDF, 10.89 MB
english, 2013