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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - The impact of realistic source shape and flexibility on source mask optimization
Aoyama, Hajime, Conley, Will, Mizuno, Yasushi, Hirayanagi, Noriyuki, Kita, Naonori, Matsui, Ryota, Izumi, Hirohiko, Tajima, Keiichi, Siebert, Joachim, Demmerle, Wolfgang, Matsuyama, TomoyukiVolume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2011353
File:
PDF, 3.82 MB
english, 2013