SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - A dose modification strategy of electron beam direct writing considering TDDB reliability in LSI interconnects
Midoh, Yoshihiro, Tong, William M., Resnick, Douglas J., Osaki, Atsushi, Nakamae, KojiVolume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2011694
File:
PDF, 1.62 MB
english, 2013