SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Block co-polymer multiple patterning directed self-assembly on PS-OH brush layer and AFM based nanolithography
Oria, Lorea, Tong, William M., Resnick, Douglas J., de Luzuriaga, Alaitz Ruiz, Alduncín, Juan Antonio, Pérez-Murano, FrancescVolume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2014515
File:
PDF, 2.02 MB
english, 2013