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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Topology and context-based pattern extraction using line-segment Voronoi diagram
Sturtevant, John L., Capodieci, Luigi, Dey, Sandeep K., Cheilaris, Panagiotis, Casati, Nathalie, Gabrani, Maria, Papadopoulo, EvanthiaVolume:
9427
Year:
2015
Language:
english
DOI:
10.1117/12.2085547
File:
PDF, 565 KB
english, 2015