SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - The effect of resist dissolution process on pattern formation variability: an in situ analysis using high-speed atomic force microscopy
Wallow, Thomas I., Hohle, Christoph K., Santillan, Julius Joseph, Shichiri, Motoharu, Itani, ToshiroVolume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085746
File:
PDF, 1.79 MB
english, 2015