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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Solution for high-order distortion on extreme illumination condition using computational prediction method
Lai, Kafai, Erdmann, Andreas, Kang, Young-Seog, Ha, Hunhwan, Kim, Jang-Sun, Shin, Ju Hee, Kim, Young Ha, Nam, Young Sun, Choi, Young-Sin, Affentauschegg, Cedric, van der Heijden, Rob W., Rizvi, Umar,Volume:
9426
Year:
2015
Language:
english
DOI:
10.1117/12.2086938
File:
PDF, 1.15 MB
english, 2015