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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Massively parallel E-beam inspection: enabling next-generation patterned defect inspection for wafer and mask manufacturing
Resnick, Douglas J., Bencher, Christopher, Malloy, Matt, Thiel, Brad, Bunday, Benjamin D., Wurm, Stefan, Mukhtar, Maseeh, Quoi, Kathy, Kemen, Thomas, Zeidler, Dirk, Eberle, Anna Lena, Garbowski, TomasVolume:
9423
Year:
2015
Language:
english
DOI:
10.1117/12.2175535
File:
PDF, 694 KB
english, 2015