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SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Strategy optimization for mask rule check in wafer fab
Yoshioka, Nobuyuki, Yang, Chuen Huei, Lin, Shaina, Lin, Roger, Wang, Alice, Lee, Rachel, Deng, ErwinVolume:
9658
Year:
2015
Language:
english
DOI:
10.1117/12.2192951
File:
PDF, 371 KB
english, 2015