SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - A study of reticle CD behavior for inter-area pattern loading difference
Hayashi, Naoya, Kasprowicz, Bryan S., Kim, Sungjin, Lee, Kweonjae, Yim, Jongsuk, Kim, Hyunjoong, Kim, Sukwhan, Shin, Sukho, Choi, Woosun, Jung, Jinhee, Chun, Kyungwha, Lee, Inja, Lee, Jooyoung, Hong,Volume:
9635
Year:
2015
Language:
english
DOI:
10.1117/12.2196988
File:
PDF, 5.58 MB
english, 2015