SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - EUV photomask defects: what prints, what doesn't, and what is required for HVM
Hayashi, Naoya, Kasprowicz, Bryan S., Rankin, Jed, Qi, Zhengqing John, Lawliss, Mark, Narita, Eisuke, Seki, Kazunori, Badger, Karen, Bonam, Ravi, Halle, Scott, Turley, ChristinaVolume:
9635
Year:
2015
Language:
english
DOI:
10.1117/12.2197476
File:
PDF, 682 KB
english, 2015