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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Reliable characterization of materials and nanostructured systems
Sanchez, Martha I., Ukraintsev, Vladimir A., Hernandez-Charpak, Jorge, Frazer, Travis, Knobloch, Joshua, Hoogeboom-Pot, Kathleen, Nardi, Damiano, Chao, Weilun, Jiang, Lei, Tripp, Marie, King, Sean, KaVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2219434
File:
PDF, 516 KB
english, 2016