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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Optimizing noise for defect analysis with through-focus scanning optical microscopy
Sanchez, Martha I., Ukraintsev, Vladimir A., Attota, Ravikiran, Kramar, JohnVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2220679
File:
PDF, 658 KB
english, 2016