SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Effects of underlayer on performance of bilayer resists for 248-nm lithography
Babich, Katherina, Callegari, Alessandro, Petrillo, Karen E., Simons, John P., LaTulipe, Douglas C., Angelopoulos, Marie, Lin, QinghuangVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312348
File:
PDF, 816 KB
english, 1998