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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Cleaning techniques for low-K dielectric materials for advanced interconnects
Louis, Didier, Lajoinie, Emile, Holmes, Douglas, Lee, Shihying, Peyne, CatherineVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312372
File:
PDF, 1.47 MB
english, 1998