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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Novel antireflective structure for metal layer patterning
Choi, Sang-Soo, Cha, Han Sun, Kim, Jong-Soo, Park, Jong Mun, Kim, Dohoon, Lee, Kag Hyeon, Ahn, Jin-Ho, Chung, Hai Bin, Kim, Bo WooVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312423
File:
PDF, 1.58 MB
english, 1998