SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Comparisons of critical parameters for high- and low-activation-energy deep-UV photoresists
Conley, Will, Babcock, Carl P., Farrar, Nigel R., Liu, Hua-Yu, Peterson, Bill, Taira, KazuoVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312425
File:
PDF, 2.54 MB
english, 1998