![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Application of plasma-polymerized methylsilane for 0.18-μm photolithography
Monget, Cedric, Lee, Carol Y., Joubert, Olivier P., Amblard, Gilles R., Weidman, Timothy W., Sugiarto, Dian, Yang, John W., Cormont, F., Inglebert, R. L.Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312426
File:
PDF, 2.32 MB
english, 1998