SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Novel strategy for the design of highly transparent ArF resists with excellent dry etch resistance
Zhao, Wenwei, Ohfuji, Takeshi, Sasago, Masaru, Tagawa, SeiichiVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312448
File:
PDF, 603 KB
english, 1998