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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Diffusion of amines from resist to BARC layer
Shirai, Masamitsu, Allen, Robert D., Somervell, Mark H., Hatsuse, Tatsuya, Okamura, Haruyuki, Kimura, Shigeo, Nakajima, YasuyukiVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879039
File:
PDF, 529 KB
english, 2011