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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Tailorable BARC system to provide optimum solutions for various substrates in immersion lithography
Swope, Michael, Allen, Robert D., Somervell, Mark H., Krishnamurthy, Vandana, Zhu, Zhimin, Sullivan, Daniel, Simmons, Sean, Cox, Chris, Bennett, Randy, Nesbit, CherylVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879462
File:
PDF, 1.35 MB
english, 2011