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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Bimetallic grayscale photomasks for micro-optics fabrication using dual wavelength laser writing techniques
Qarehbaghi, Reza, Abboud, Frank E., Faure, Thomas B., Chapman, Glenn H.Volume:
8522
Year:
2012
Language:
english
DOI:
10.1117/12.977189
File:
PDF, 2.45 MB
english, 2012