[IEEE 2015 IEEE Conference on Control Applications (CCA) - Sydney, Australia (2015.9.21-2015.9.23)] 2015 IEEE Conference on Control Applications (CCA) - Optimization and simulation of exposure pattern for scanning laser lithography
Ghalehbeygi, Omid T., Berriman, Garth, Fleming, Andrew J., Holdsworth, John L.Year:
2015
Language:
english
DOI:
10.1109/cca.2015.7320882
File:
PDF, 254 KB
english, 2015