[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - Novel slurry injection system for improved slurry flow, enhanced material removal and reduced defects in CMP
Zhuang, Yun, Sampurno, Yasa, Borucki, Leonard, Philipossian, AraYear:
2014
Language:
english
DOI:
10.1109/icpt.2014.7017242
File:
PDF, 620 KB
english, 2014