[IEEE 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2015.5.3-2015.5.6)] 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Modelling of the electrochemical etch stop with high reverse bias across pn-junctions
Szwarc, Robert, Frey, Lothar, Weber, Hans, Moder, Iris, Erlbacher, Tobias, Rommel, Mathias, Bauer, Anton J.Year:
2015
Language:
english
DOI:
10.1109/asmc.2015.7164437
File:
PDF, 575 KB
english, 2015