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[IEEE 2015 IEEE SENSORS - Busan, South Korea (2015.11.1-2015.11.4)] 2015 IEEE SENSORS - Oxide or metal interface damage improvement of deep silicon etch process by low power RF of low frequency
Cheng, Shyh-Wei, Weng, Jui-Chun, Hung, Chung-Hsien, Li, Chun-Peng, Meng, Chin-Hau, Liang, Kai-Chih, Fang, WeileunYear:
2015
Language:
english
DOI:
10.1109/ICSENS.2015.7370283
File:
PDF, 873 KB
english, 2015