A Vapor Phase Self-Assembly of Porphyrin Monolayer as a Copper Diffusion Barrier for Back-End-of-Line CMOS Technologies
Naik, Tejas R., Singh, Vibhas, Ravikanth, M., Rao, V. RamgopalYear:
2016
Language:
english
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/TED.2016.2537370
File:
PDF, 1.64 MB
english, 2016