[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - CMP material development for ceria-based applications
Tseng, Ron, Tsai, David, Tung, Kevin, DeGroot, Marty W., Qian, Bainian, Park, Youngrae, Buley, Todd W.Year:
2014
Language:
english
DOI:
10.1109/icpt.2014.7017306
File:
PDF, 801 KB
english, 2014