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[IEEE 2006 IEEE Nanotechnology Materials and Devices Conference - Gyeongju, South Korea (2006.10.22-2006.10.25)] 2006 IEEE Nanotechnology Materials and Devices Conference - Interfacial layer thickness dependence of the low- frequency noise in high-k dielectric MOSFETs
Hyungdo Nam,, Jungil Lee,, Ilki Han,, Haesuk Yang,Year:
2006
Language:
english
DOI:
10.1109/nmdc.2006.4388881
File:
PDF, 386 KB
english, 2006