Active shielding suitable for electron-beam lithography...

IEEE Transactions on Magnetics 2003 / 09 Vol. 39; Iss. 5

Active shielding suitable for electron-beam lithography systems

Yamazaki, K., Kato, K., Ashiho, K., Uda, T., Fujiwara, K., Takahashi, N., Haga, A., Sato, T., Uegaki, J., Sakuma, Y.
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Volume:
39
Language:
english
Journal:
IEEE Transactions on Magnetics
DOI:
10.1109/tmag.2003.816730
Date:
September, 2003
File:
PDF, 748 KB
english, 2003
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