[IEEE 2015 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2015.4.27-2015.4.29)] 2015 International Symposium on VLSI Technology, Systems and Applications - Improvement of Si doping of In0.53Ga0.47As fin by heated implant
Wood, Bingxi, Hatem, Christopher, Bao, Xinyu, Zhou, Hongwen, Zhang, Ming, Jin, Miao, Chen, Hao, Cai, Man-Ping, Munnangi, Samuel Swaroop, Okazaki, Motoya, Sanchez, Errol, Brand, AdamYear:
2015
Language:
english
DOI:
10.1109/vlsi-tsa.2015.7117572
File:
PDF, 240 KB
english, 2015