SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Analytical equation predicting the forbidden pattern pitch for phase-shifting mask
Tamaki, Junichi, Conley, Will, Shibuya, Masato, Suezou, NakadateVolume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2010770
File:
PDF, 644 KB
english, 2013