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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Dressed-photon nanopolishing for extreme ultraviolet mask substrate defect mitigation
Teki, Ranganath, Naulleau, Patrick P., Kadaksham, Arun John, Goodwin, Frank, Yatsui, Takashi, Ohtsu, MotoichiVolume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2011260
File:
PDF, 1.34 MB
english, 2013