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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Design strategy of small topographical guiding templates for sub-15nm integrated circuits contact hole patterns using block copolymer directed self assembly
Yi, He, Tong, William M., Resnick, Douglas J., Bao, Xin-Yu, Tiberio, Richard, Wong, H.-S. PhilipVolume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2011263
File:
PDF, 1.95 MB
english, 2013