SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Track processing optimizations for different EUV resist platforms: preparing for a NXE:3300 baseline process
Foubert, Philippe, Naulleau, Patrick P., Matsunaga, Koichi, Shite, Hideo, Shimoaoki, Takeshi, Nafus, Kathleen, Goethals, Anne-Marie, Van Den Heuvel, Dieter, Hermans, Jan, Hendrickx, Eric, Kosugi, HitoVolume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2011514
File:
PDF, 3.05 MB
english, 2013