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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Mix & match electron beam & scanning probe lithography for high throughput sub-10 nm lithography
Kaestner, Marcus, Tong, William M., Resnick, Douglas J., Hofer, Manuel, Rangelow, Ivo W.Volume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2011535
File:
PDF, 1.82 MB
english, 2013