SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Avoiding wafer-print artifacts in spacer is dielectric (SID) patterning

Luk-Pat, Gerard, Conley, Will, Painter, Ben, Miloslavsky, Alex, De Bisschop, Peter, Beacham, Adam, Lucas, Kevin
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Volume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2011539
File:
PDF, 854 KB
english, 2013
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