![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Avoiding wafer-print artifacts in spacer is dielectric (SID) patterning
Luk-Pat, Gerard, Conley, Will, Painter, Ben, Miloslavsky, Alex, De Bisschop, Peter, Beacham, Adam, Lucas, KevinVolume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2011539
File:
PDF, 854 KB
english, 2013