SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Process and proximity correction, and verification for extreme ultraviolet lithography
Perçin, Gökhan, Naulleau, Patrick P., Dai, Huixiong, Huang, Hsu-Ting, Liu, Anwei, Mokhberi, Ali, Zheng, Xin, Ngai, ChrisVolume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2011666
File:
PDF, 1.51 MB
english, 2013