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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - The impact of 14-nm photomask uncertainties on computational lithography solutions
Sturtevant, John, Conley, Will, Tejnil, Edita, Lin, Tim, Schultze, Steffen, Buck, Peter, Kalk, Franklin, Nakagawa, Kent, Ning, Guoxiang, Ackmann, Paul, Gans, Fritz, Buergel, ChristianVolume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2013748
File:
PDF, 761 KB
english, 2013