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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - At wavelength observation of phase defect embedded in EUV mask using microscope technique
Wood, Obert R., Panning, Eric M., Terasawa, Tsuneo, Amano, Tsuyoshi, Yamane, Takeshi, Watanabe, Hidehiro, Toyoda, Mitsunori, Harada, Tetsuo, Watanabe, Takeo, Kinoshita, HirooVolume:
9048
Year:
2014
Language:
english
DOI:
10.1117/12.2046156
File:
PDF, 1.88 MB
english, 2014