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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Scanner effects on directed self-assembly patterning
Resnick, Douglas J., Bencher, Christopher, Renwick, Stephen P.Volume:
9049
Year:
2014
Language:
english
DOI:
10.1117/12.2046567
File:
PDF, 1.73 MB
english, 2014