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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - The REBL DPG: recent innovations and remaining challenges
Resnick, Douglas J., Bencher, Christopher, Carroll, Allen, Grella, Luca, Murray, Kirk, McCord, Mark A., Petric, Paul, Tong, William M., Bevis, Christopher F., Lin, Shy-Jay, Yu, Tsung-Hsin, Huang, Tze-Volume:
9049
Year:
2014
Language:
english
DOI:
10.1117/12.2048528
File:
PDF, 624 KB
english, 2014