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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Optical CD metrology for directed self-assembly assisted contact hole shrink process
Cain, Jason P., Sanchez, Martha I., Dixit, Dhairya, Hosler, Erik R., Preil, Moshe, Keller, Nick, Race, Joseph, Chun, Jun Sung, O’Sullivan, Michael, Montgomery, M. Warren, Diebold, AlainVolume:
9424
Year:
2015
Language:
english
DOI:
10.1117/12.2085054
File:
PDF, 7.76 MB
english, 2015